RT Book, Section
A1 Ly, Binh T.
A2 Olson, Kent R.
SR Print(0)
ID 55977582
T1 Chapter 81. Hydrogen Fluoride and Hydrofluoric Acid
T2 Poisoning & Drug Overdose, 6e
YR 2012
FD 2012
PB The McGraw-Hill Companies
PP New York, NY
SN 978-0-07-166833-0
LK accessmedicine.mhmedical.com/content.aspx?aid=55977582
RD 2021/04/11
AB Hydrogen  fluoride  (HF)  is  an  irritant  gas  that  liquefies  at  19.5°C;  in  an  aqueous  solution,  it  produces  hydrofluoric  acid.  HF  gas  is  used  in  chemical  manufacturing.  In  addition,  it  may  be  released  from  fluorosilicates,  fluorocarbons,  or  Teflon  when  heated  to  over  350°C.  Hydrofluoric  acid  (aqueous  HF  solution)  is  widely  used  as  a  rust  remover,  in  glass  etching,  and  in  the  manufacture  of  silicon  semiconductor  chips.  Hydrofluoric  acid  events  at  the  workplace  were  shown  to  be  two  times  more  likely  to  involve  injuries  compared  with  other  acids.  Poisoning  usually  occurs  after  dermal  exposure,  although  ingestions  and  inhalations  occasionally  occur.  Similar  toxicity  can  result  from  exposure  to  ammonium  bifluoride.